- The system is equipped with both a flood gun for charge compensation and an ion gun for controlled etching of surface layers while it is also capable of Ar+ cluster etch which allows for the removal of surface contaminants without damaging the surface.
- Two X-ray sources are available, one is the standard monochromatic Al-Kα source and the other one is an Ag-Lα which has greater ionization energy allowing inner core orbital excitations.
- UV photoelectron spectroscopy (UPS) allows valence band measurements of all sample types and evaluation of the work function for conducting samples.
- Ion Scattering Spectroscopy (ISS) is also available, allowing inspection of the topmost atomic layer composition of samples.
- Reflected electron energy loss spectroscopy (REELS) can allow measurement of electronic structure and the band gap surface plasmon phenomena and detection of hydrogen.
- A heating stage allows measurements to be performed in-situ in a temperature range from LN2 up to 700o